According to our (Global Info Research) latest study, the global Semiconductor Photoresist market size was valued at US$ 3436 million in 2025 and is forecast to a readjusted size of US$ 5255 million by 2032 with a CAGR of 6.4% during review period.
Photoresist (PR) is a chemical essential for semiconductor manufacturing. The photoresists known as a photosensitive material, initiate a chemical reaction in the light. It is a chemical that plays an essential role in photolithography, a technology that is involved in the manufacture of semiconductor devices. In the semiconductor manufacturing, the exposure process that a photoengraving technique is applied to reduce and transfer the design drawn on the original plate (photomask) onto the silicon chip. To create power-saving, high-performance semiconductors, the circuits that are to be transferred need to be rendered smaller.
Structurally, the mix in 2025 is still DUV-dominated: ArFi (~26.1%) + KrF (~25.5%) + g/i-Line (~24.6%) ≈ 76% of total value, reflecting the reality that even in leading-edge flows, EUV is used for the most intricate layers while many remaining layers continue to be patterned with DUV, and both platforms run in parallel for years. Within DUV, ArFi’s weight is also consistent with technology boundaries: for many “mainstream-to-advanced mature” nodes, immersion ArF remains a foundational lithography capability. Meanwhile, EUV photoresists are the clear growth engine (rising from ~$80M to ~$374M from 2020 to 2025; fastest growth rate among your segments), but still only ~11.2% of the 2025 total—i.e., EUV is driving the growth, while DUV still carries the volume and breadth of layers.
Looking forward over the next few years, the direction is: EUV grows fastest; ArFi stays resilient; KrF and g/i-Line remain stable-to-slight growth; ArF Dry grows modestly; E-beam grows steadily but niche—each for different “real-fab” reasons. EUV resists should keep outgrowing the market because EUV layer counts and EUV exposure intensity rise with continued scaling, and the ecosystem is now also entering the High-NA EUV era (tool milestones such as acceptance testing and High-NA platform ramp are now public), which tightens resist requirements and pulls more innovation spend into EUV materials (stochastics/roughness/sensitivity tradeoffs, outgassing control, etc.). ArFi resists are likely to remain the “workhorse premium DUV” category: even where EUV expands, ArFi continues to print many non-EUV layers and supports huge installed bases at 28/22/16/14nm-class and below, and a lot of capacity being added globally is still in ranges that rely on ArFi capability. ArF Dry typically tracks a broad swath of mature logic and specialty IC production, so expect low-to-mid single-digit growth driven more by wafer-start expansion and mix (specialty, analog, PMIC, CIS, etc.) than by “node shrinks.” KrF should stay solid because it sits in the cost/performance sweet spot for many mature nodes and selected tighter-pattern layers where ArF isn’t required; its main driver is mature-node capacity + automotive/industrial stability, with cyclicality tied to overall wafer starts. g/i-Line is “sticky” for thick resist and back-end / packaging-centric lithography, so advanced packaging scaling (more RDL layers, bumping/plating processes, wafer-/panel-level packaging) tends to underpin demand even when leading-edge front-end is soft; suppliers explicitly position g/i-line portfolios around thick-film variants and packaging-related patterning use-cases (including RDL). E-beam resists should grow steadily (but remain small) because advanced mask making—especially EUV masks—depends heavily on e-beam lithography resist performance, and mask complexity rises as design rules tighten. Macro-wise, a supportive tailwind for all categories is the expectation that wafer-fab investment and capacity expansion are lifted by AI-driven logic and memory demand into 2026–2027, which typically flows through into lithography materials consumption with a lag.
This report is a detailed and comprehensive analysis for global Semiconductor Photoresist market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Semiconductor Photoresist market size and forecasts, in consumption value ($ Million), sales quantity (K Gallon), and average selling prices (USD/Gallon), 2021-2032
Global Semiconductor Photoresist market size and forecasts by region and country, in consumption value ($ Million), sales quantity (K Gallon), and average selling prices (USD/Gallon), 2021-2032
Global Semiconductor Photoresist market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (K Gallon), and average selling prices (USD/Gallon), 2021-2032
Global Semiconductor Photoresist market shares of main players, shipments in revenue ($ Million), sales quantity (K Gallon), and ASP (USD/Gallon), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Semiconductor Photoresist
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Semiconductor Photoresist market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include TOKYO OHKA KOGYO CO., LTD. (TOK), JSR, Shin-Etsu Chemical, DuPont, Fujifilm, Sumitomo Chemical, Dongjin Semichem, Merck KGaA (AZ), Allresist GmbH, Futurrex, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Semiconductor Photoresist market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
EUV Photoresist
ArFi Photoresist
ArF Dry Photoresist
KrF Photoresist
g/i-Line
Others
Market segment by Imaging Mechanism
Positive Photoresists
Negative Photoresists
Market segment by Process Node
High End / Advanced <14nm
Mid End 18/22/28-90nm
Low End >110nm
DRAM and NAND
Market segment by Application
IC Manufacturing
Advanced Packaging
Major players covered
TOKYO OHKA KOGYO CO., LTD. (TOK)
JSR
Shin-Etsu Chemical
DuPont
Fujifilm
Sumitomo Chemical
Dongjin Semichem
Merck KGaA (AZ)
Allresist GmbH
Futurrex
KemLab™ Inc
YCCHEM Co., Ltd
SK Materials Performance (SKMP)
Everlight Chemical
Red Avenue
Crystal Clear Electronic Material
Xuzhou B & C Chemical
Xiamen Hengkun New Material Technology
Jiangsu Aisen Semiconductor Material
Zhuhai Cornerstone Technologies
Shanghai Sinyang Semiconductor Materials
ShenZhen RongDa Photosensitive Science & Technology
SINEVA
Guoke Tianji
Jiangsu Nata Opto-electronic Material
PhiChem
Zeon Corporation
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Semiconductor Photoresist product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Semiconductor Photoresist, with price, sales quantity, revenue, and global market share of Semiconductor Photoresist from 2021 to 2026.
Chapter 3, the Semiconductor Photoresist competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Semiconductor Photoresist breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2021 to 2032.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2021 to 2032.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2021 to 2026.and Semiconductor Photoresist market forecast, by regions, by Type, and by Application, with sales and revenue, from 2027 to 2032.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Semiconductor Photoresist.
Chapter 14 and 15, to describe Semiconductor Photoresist sales channel, distributors, customers, research findings and conclusion.
Summary:
Get latest Market Research Reports on Semiconductor Photoresist. Industry analysis & Market Report on Semiconductor Photoresist is a syndicated market report, published as Global Semiconductor Photoresist Market 2026 by Manufacturers, Regions, Type and Application, Forecast to 2032. It is complete Research Study and Industry Analysis of Semiconductor Photoresist market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.