Report Detail
Global High-Purity Ru Sputtering Target for Semiconductor Market 2026 by Manufacturers, Regions, Type and Application, Forecast to 2032
- RnM4671762 |
- 10 February, 2026 |
- Global |
- 93 Pages |
- GIR |
- Chemical & Material
According to our (Global Info Research) latest study, the global High-Purity Ru Sputtering Target for Semiconductor market size was valued at US$ 66.88 million in 2025 and is forecast to a readjusted size of US$ 112 million by 2032 with a CAGR of 7.7% during review period.
High-Purity Ru Sputtering Targets for semiconductors are targets manufactured from high-purity ruthenium metal, typically ≥99.99%, for use in physical vapor deposition (PVD) magnetron sputtering processes in semiconductor fabrication. Produced by advanced casting or powder metallurgy routes combined with hot isostatic pressing, these targets offer excellent chemical stability, high-temperature and corrosion resistance, and reliable electrical conductivity at the nanoscale. They are widely applied as diffusion barrier or seed layers in advanced interconnects, as well as electrodes and interface layers in logic and memory devices, where stringent control of purity, density, and microstructure is essential.
In 2025, the global production of high-purity ruthenium sputtering targets for semiconductors reached 1,345 kg, with an average selling price of US$48.6/gram and a capacity of approximately 2.3 tons. The industry's gross profit margin was approximately 20%–30%. Raw materials accounted for over 90% of the cost structure. The industry chain consists of upstream industries such as ruthenium ore and platinum group metal associated ores, precious metal refining and purification, and recycled ruthenium, while downstream industries use it in the semiconductor industry.
This report is a detailed and comprehensive analysis for global High-Purity Ru Sputtering Target for Semiconductor market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global High-Purity Ru Sputtering Target for Semiconductor market size and forecasts, in consumption value ($ Million), sales quantity (Kg), and average selling prices (US$/g), 2021-2032
Global High-Purity Ru Sputtering Target for Semiconductor market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Kg), and average selling prices (US$/g), 2021-2032
Global High-Purity Ru Sputtering Target for Semiconductor market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Kg), and average selling prices (US$/g), 2021-2032
Global High-Purity Ru Sputtering Target for Semiconductor market shares of main players, shipments in revenue ($ Million), sales quantity (Kg), and ASP (US$/g), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for High-Purity Ru Sputtering Target for Semiconductor
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global High-Purity Ru Sputtering Target for Semiconductor market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include JX Advanced Metals, Tosoh SMD, Furuya Metal, Kurt J. Lesker, Henan Oriental Materials, Grikin Advanced Materials, Alfa Chemistry, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
High-Purity Ru Sputtering Target for Semiconductor market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Purity ≥ 4N
Purity ≥ 5N
Market segment by Manufacturing Process
Sintered Ruthenium Target
Melted Ruthenium Target
Market segment by Process Technology
Traditional Process Technology (≥28nm)
Advanced Process Technology (<28nm)
Market segment by Application
Data Storage
Logic Chip
MEMS System
Others
Major players covered
JX Advanced Metals
Tosoh SMD
Furuya Metal
Kurt J. Lesker
Henan Oriental Materials
Grikin Advanced Materials
Alfa Chemistry
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe High-Purity Ru Sputtering Target for Semiconductor product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of High-Purity Ru Sputtering Target for Semiconductor, with price, sales quantity, revenue, and global market share of High-Purity Ru Sputtering Target for Semiconductor from 2021 to 2026.
Chapter 3, the High-Purity Ru Sputtering Target for Semiconductor competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the High-Purity Ru Sputtering Target for Semiconductor breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2021 to 2032.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2021 to 2032.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2021 to 2026.and High-Purity Ru Sputtering Target for Semiconductor market forecast, by regions, by Type, and by Application, with sales and revenue, from 2027 to 2032.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of High-Purity Ru Sputtering Target for Semiconductor.
Chapter 14 and 15, to describe High-Purity Ru Sputtering Target for Semiconductor sales channel, distributors, customers, research findings and conclusion.
1 Market Overview
- 1.1 Product Overview and Scope
- 1.2 Market Estimation Caveats and Base Year
- 1.3 Market Analysis by Type
- 1.3.1 Overview: Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Type: 2021 Versus 2025 Versus 2032
- 1.3.2 Purity ≥ 4N
- 1.3.3 Purity ≥ 5N
- 1.4 Market Analysis by Manufacturing Process
- 1.4.1 Overview: Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Manufacturing Process: 2021 Versus 2025 Versus 2032
- 1.4.2 Sintered Ruthenium Target
- 1.4.3 Melted Ruthenium Target
- 1.5 Market Analysis by Process Technology
- 1.5.1 Overview: Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Process Technology: 2021 Versus 2025 Versus 2032
- 1.5.2 Traditional Process Technology (≥28nm)
- 1.5.3 Advanced Process Technology (<28nm)
- 1.6 Market Analysis by Application
- 1.6.1 Overview: Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Application: 2021 Versus 2025 Versus 2032
- 1.6.2 Data Storage
- 1.6.3 Logic Chip
- 1.6.4 MEMS System
- 1.6.5 Others
- 1.7 Global High-Purity Ru Sputtering Target for Semiconductor Market Size & Forecast
- 1.7.1 Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value (2021 & 2025 & 2032)
- 1.7.2 Global High-Purity Ru Sputtering Target for Semiconductor Sales Quantity (2021-2032)
- 1.7.3 Global High-Purity Ru Sputtering Target for Semiconductor Average Price (2021-2032)
2 Manufacturers Profiles
- 2.1 JX Advanced Metals
- 2.1.1 JX Advanced Metals Details
- 2.1.2 JX Advanced Metals Major Business
- 2.1.3 JX Advanced Metals High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.1.4 JX Advanced Metals High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.1.5 JX Advanced Metals Recent Developments/Updates
- 2.2 Tosoh SMD
- 2.2.1 Tosoh SMD Details
- 2.2.2 Tosoh SMD Major Business
- 2.2.3 Tosoh SMD High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.2.4 Tosoh SMD High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.2.5 Tosoh SMD Recent Developments/Updates
- 2.3 Furuya Metal
- 2.3.1 Furuya Metal Details
- 2.3.2 Furuya Metal Major Business
- 2.3.3 Furuya Metal High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.3.4 Furuya Metal High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.3.5 Furuya Metal Recent Developments/Updates
- 2.4 Kurt J. Lesker
- 2.4.1 Kurt J. Lesker Details
- 2.4.2 Kurt J. Lesker Major Business
- 2.4.3 Kurt J. Lesker High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.4.4 Kurt J. Lesker High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.4.5 Kurt J. Lesker Recent Developments/Updates
- 2.5 Henan Oriental Materials
- 2.5.1 Henan Oriental Materials Details
- 2.5.2 Henan Oriental Materials Major Business
- 2.5.3 Henan Oriental Materials High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.5.4 Henan Oriental Materials High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.5.5 Henan Oriental Materials Recent Developments/Updates
- 2.6 Grikin Advanced Materials
- 2.6.1 Grikin Advanced Materials Details
- 2.6.2 Grikin Advanced Materials Major Business
- 2.6.3 Grikin Advanced Materials High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.6.4 Grikin Advanced Materials High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.6.5 Grikin Advanced Materials Recent Developments/Updates
- 2.7 Alfa Chemistry
- 2.7.1 Alfa Chemistry Details
- 2.7.2 Alfa Chemistry Major Business
- 2.7.3 Alfa Chemistry High-Purity Ru Sputtering Target for Semiconductor Product and Services
- 2.7.4 Alfa Chemistry High-Purity Ru Sputtering Target for Semiconductor Sales Quantity, Average Price, Revenue, Gross Margin and Market Share (2021-2026)
- 2.7.5 Alfa Chemistry Recent Developments/Updates
3 Competitive Environment: High-Purity Ru Sputtering Target for Semiconductor by Manufacturer
- 3.1 Global High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Manufacturer (2021-2026)
- 3.2 Global High-Purity Ru Sputtering Target for Semiconductor Revenue by Manufacturer (2021-2026)
- 3.3 Global High-Purity Ru Sputtering Target for Semiconductor Average Price by Manufacturer (2021-2026)
- 3.4 Market Share Analysis (2025)
- 3.4.1 Producer Shipments of High-Purity Ru Sputtering Target for Semiconductor by Manufacturer Revenue ($MM) and Market Share (%): 2025
- 3.4.2 Top 3 High-Purity Ru Sputtering Target for Semiconductor Manufacturer Market Share in 2025
- 3.4.3 Top 6 High-Purity Ru Sputtering Target for Semiconductor Manufacturer Market Share in 2025
- 3.5 High-Purity Ru Sputtering Target for Semiconductor Market: Overall Company Footprint Analysis
- 3.5.1 High-Purity Ru Sputtering Target for Semiconductor Market: Region Footprint
- 3.5.2 High-Purity Ru Sputtering Target for Semiconductor Market: Company Product Type Footprint
- 3.5.3 High-Purity Ru Sputtering Target for Semiconductor Market: Company Product Application Footprint
- 3.6 New Market Entrants and Barriers to Market Entry
- 3.7 Mergers, Acquisition, Agreements, and Collaborations
4 Consumption Analysis by Region
- 4.1 Global High-Purity Ru Sputtering Target for Semiconductor Market Size by Region
- 4.1.1 Global High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Region (2021-2032)
- 4.1.2 Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Region (2021-2032)
- 4.1.3 Global High-Purity Ru Sputtering Target for Semiconductor Average Price by Region (2021-2032)
- 4.2 North America High-Purity Ru Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 4.3 Europe High-Purity Ru Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 4.4 Asia-Pacific High-Purity Ru Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 4.5 South America High-Purity Ru Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 4.6 Middle East & Africa High-Purity Ru Sputtering Target for Semiconductor Consumption Value (2021-2032)
5 Market Segment by Type
- 5.1 Global High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Type (2021-2032)
- 5.2 Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Type (2021-2032)
- 5.3 Global High-Purity Ru Sputtering Target for Semiconductor Average Price by Type (2021-2032)
6 Market Segment by Application
- 6.1 Global High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Application (2021-2032)
- 6.2 Global High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Application (2021-2032)
- 6.3 Global High-Purity Ru Sputtering Target for Semiconductor Average Price by Application (2021-2032)
7 North America
- 7.1 North America High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Type (2021-2032)
- 7.2 North America High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Application (2021-2032)
- 7.3 North America High-Purity Ru Sputtering Target for Semiconductor Market Size by Country
- 7.3.1 North America High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Country (2021-2032)
- 7.3.2 North America High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Country (2021-2032)
- 7.3.3 United States Market Size and Forecast (2021-2032)
- 7.3.4 Canada Market Size and Forecast (2021-2032)
- 7.3.5 Mexico Market Size and Forecast (2021-2032)
8 Europe
- 8.1 Europe High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Type (2021-2032)
- 8.2 Europe High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Application (2021-2032)
- 8.3 Europe High-Purity Ru Sputtering Target for Semiconductor Market Size by Country
- 8.3.1 Europe High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Country (2021-2032)
- 8.3.2 Europe High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Country (2021-2032)
- 8.3.3 Germany Market Size and Forecast (2021-2032)
- 8.3.4 France Market Size and Forecast (2021-2032)
- 8.3.5 United Kingdom Market Size and Forecast (2021-2032)
- 8.3.6 Russia Market Size and Forecast (2021-2032)
- 8.3.7 Italy Market Size and Forecast (2021-2032)
9 Asia-Pacific
- 9.1 Asia-Pacific High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Type (2021-2032)
- 9.2 Asia-Pacific High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Application (2021-2032)
- 9.3 Asia-Pacific High-Purity Ru Sputtering Target for Semiconductor Market Size by Region
- 9.3.1 Asia-Pacific High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Region (2021-2032)
- 9.3.2 Asia-Pacific High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Region (2021-2032)
- 9.3.3 China Market Size and Forecast (2021-2032)
- 9.3.4 Japan Market Size and Forecast (2021-2032)
- 9.3.5 South Korea Market Size and Forecast (2021-2032)
- 9.3.6 India Market Size and Forecast (2021-2032)
- 9.3.7 Southeast Asia Market Size and Forecast (2021-2032)
- 9.3.8 Australia Market Size and Forecast (2021-2032)
10 South America
- 10.1 South America High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Type (2021-2032)
- 10.2 South America High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Application (2021-2032)
- 10.3 South America High-Purity Ru Sputtering Target for Semiconductor Market Size by Country
- 10.3.1 South America High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Country (2021-2032)
- 10.3.2 South America High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Country (2021-2032)
- 10.3.3 Brazil Market Size and Forecast (2021-2032)
- 10.3.4 Argentina Market Size and Forecast (2021-2032)
11 Middle East & Africa
- 11.1 Middle East & Africa High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Type (2021-2032)
- 11.2 Middle East & Africa High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Application (2021-2032)
- 11.3 Middle East & Africa High-Purity Ru Sputtering Target for Semiconductor Market Size by Country
- 11.3.1 Middle East & Africa High-Purity Ru Sputtering Target for Semiconductor Sales Quantity by Country (2021-2032)
- 11.3.2 Middle East & Africa High-Purity Ru Sputtering Target for Semiconductor Consumption Value by Country (2021-2032)
- 11.3.3 Turkey Market Size and Forecast (2021-2032)
- 11.3.4 Egypt Market Size and Forecast (2021-2032)
- 11.3.5 Saudi Arabia Market Size and Forecast (2021-2032)
- 11.3.6 South Africa Market Size and Forecast (2021-2032)
12 Market Dynamics
- 12.1 High-Purity Ru Sputtering Target for Semiconductor Market Drivers
- 12.2 High-Purity Ru Sputtering Target for Semiconductor Market Restraints
- 12.3 High-Purity Ru Sputtering Target for Semiconductor Trends Analysis
- 12.4 Porters Five Forces Analysis
- 12.4.1 Threat of New Entrants
- 12.4.2 Bargaining Power of Suppliers
- 12.4.3 Bargaining Power of Buyers
- 12.4.4 Threat of Substitutes
- 12.4.5 Competitive Rivalry
13 Raw Material and Industry Chain
- 13.1 Raw Material of High-Purity Ru Sputtering Target for Semiconductor and Key Manufacturers
- 13.2 Manufacturing Costs Percentage of High-Purity Ru Sputtering Target for Semiconductor
- 13.3 High-Purity Ru Sputtering Target for Semiconductor Production Process
- 13.4 Industry Value Chain Analysis
14 Shipments by Distribution Channel
- 14.1 Sales Channel
- 14.1.1 Direct to End-User
- 14.1.2 Distributors
- 14.2 High-Purity Ru Sputtering Target for Semiconductor Typical Distributors
- 14.3 High-Purity Ru Sputtering Target for Semiconductor Typical Customers
15 Research Findings and Conclusion
16 Appendix
- 16.1 Methodology
- 16.2 Research Process and Data Source
Summary:
Get latest Market Research Reports on High-Purity Ru Sputtering Target for Semiconductor. Industry analysis & Market Report on High-Purity Ru Sputtering Target for Semiconductor is a syndicated market report, published as Global High-Purity Ru Sputtering Target for Semiconductor Market 2026 by Manufacturers, Regions, Type and Application, Forecast to 2032. It is complete Research Study and Industry Analysis of High-Purity Ru Sputtering Target for Semiconductor market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.
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