According to our (Global Info Research) latest study, the global EUV Mask Multilayer Materials market size was valued at US$ 548 million in 2025 and is forecast to a readjusted size of US$ 839 million by 2032 with a CAGR of 6.3% during review period.
EUV mask multilayer materials refer to nanometer-scale molybdenum and silicon thin-film stacks deposited on a highly polished substrate. These alternating Mo/Si layers form a Bragg reflector optimized for 13.5 nm wavelength, enabling high reflectivity, low defect density, and stable optical performance essential for EUV lithography. The material is fundamental for the fabrication of EUV mask blanks used in 5 nm, 3 nm, and next-generation semiconductor processes.
The upstream segment includes ultra-high-purity Mo and Si sputtering targets, defect-free LTEM or fused-silica substrates, precision super-polishing equipment, and ultra-high-vacuum deposition tools. The midstream consists of multilayer deposition providers in Japan, the US, South Korea, and Europe, responsible for substrate preparation, atomic-scale Mo/Si layer deposition, stress control, defect inspection, and optical metrology. Downstream users include EUV mask blank suppliers and advanced semiconductor fabs adopting EUV lithography for 5 nm and below. End users focus on reflectivity uniformity, thermal stability, defect density (<5 defects/cm²), low-stress film structures, and compatibility with High-NA EUV systems.
The market for EUV multilayer mask materials is expanding steadily as chip manufacturers continue migrating to advanced nodes that require EUV lithography. Growth is driven by increasing demand for 5 nm and 3 nm production, as well as the upcoming transition to High-NA EUV. Suppliers are investing heavily in ultra-pure sputtering targets, defect-free substrates, and atomic-precision deposition technologies to meet more stringent optical and mechanical performance requirements. Due to extremely high entry barriers, the industry remains dominated by a small group of suppliers with advanced metrology and coating capabilities. As semiconductor fabs push for lower defect densities and higher mask yields, continued innovation in multilayer uniformity control, film stress optimization, and advanced inspection will shape the future competitiveness of this market.
This report is a detailed and comprehensive analysis for global EUV Mask Multilayer Materials market. Both quantitative and qualitative analyses are presented by company, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global EUV Mask Multilayer Materials market size and forecasts, in consumption value ($ Million), 2021-2032
Global EUV Mask Multilayer Materials market size and forecasts by region and country, in consumption value ($ Million), 2021-2032
Global EUV Mask Multilayer Materials market size and forecasts, by Type and by Application, in consumption value ($ Million), 2021-2032
Global EUV Mask Multilayer Materials market shares of main players, in revenue ($ Million), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for EUV Mask Multilayer Materials
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global EUV Mask Multilayer Materials market based on the following parameters - company overview, revenue, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include HOYA, AGC, Shin-Etsu, Toppan, Photronics, DNP, S&S TECH, Schott Lithotec, ULVAC, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market segmentation
EUV Mask Multilayer Materials market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for Consumption Value by Type and by Application. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Magnetron Sputtered Multilayer
Ion-Beam Sputtered Multilayer
E-Beam Deposited Multilayer
Others
Market segment by Performance Features
High-Reflectivity EUV Multilayer
Oxidation-Resistant Multilayer
Others
Market segment by Application
Semiconductor Manufacturing
Photomask Production
Others
Market segment by players, this report covers
HOYA
AGC
Shin-Etsu
Toppan
Photronics
DNP
S&S TECH
Schott Lithotec
ULVAC
Market segment by regions, regional analysis covers
North America (United States, Canada and Mexico)
Europe (Germany, France, UK, Russia, Italy and Rest of Europe)
Asia-Pacific (China, Japan, South Korea, India, Southeast Asia and Rest of Asia-Pacific)
South America (Brazil, Rest of South America)
Middle East & Africa (Turkey, Saudi Arabia, UAE, Rest of Middle East & Africa)
The content of the study subjects, includes a total of 13 chapters:
Chapter 1, to describe EUV Mask Multilayer Materials product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top players of EUV Mask Multilayer Materials, with revenue, gross margin, and global market share of EUV Mask Multilayer Materials from 2021 to 2026.
Chapter 3, the EUV Mask Multilayer Materials competitive situation, revenue, and global market share of top players are analyzed emphatically by landscape contrast.
Chapter 4 and 5, to segment the market size by Type and by Application, with consumption value and growth rate by Type, by Application, from 2021 to 2032.
Chapter 6, 7, 8, 9, and 10, to break the market size data at the country level, with revenue and market share for key countries in the world, from 2021 to 2026.and EUV Mask Multilayer Materials market forecast, by regions, by Type and by Application, with consumption value, from 2027 to 2032.
Chapter 11, market dynamics, drivers, restraints, trends, Porters Five Forces analysis.
Chapter 12, the key raw materials and key suppliers, and industry chain of EUV Mask Multilayer Materials.
Chapter 13, to describe EUV Mask Multilayer Materials research findings and conclusion.
Summary:
Get latest Market Research Reports on EUV Mask Multilayer Materials. Industry analysis & Market Report on EUV Mask Multilayer Materials is a syndicated market report, published as Global EUV Mask Multilayer Materials Market 2026 by Company, Regions, Type and Application, Forecast to 2032. It is complete Research Study and Industry Analysis of EUV Mask Multilayer Materials market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.