Global Sputtering Target for Semiconductor Supply, Demand and Key Producers, 2026-2032
1 Supply Summary
- 1.1 Sputtering Target for Semiconductor Introduction
- 1.2 World Sputtering Target for Semiconductor Market Size & Forecast (2021 & 2025 & 2032)
- 1.3 World Sputtering Target for Semiconductor Total Market by Region (by Headquarter Location)
- 1.3.1 World Sputtering Target for Semiconductor Market Size by Region (2021-2032), (by Headquarter Location)
- 1.3.2 United States Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.3.3 China Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.3.4 Europe Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.3.5 Japan Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.3.6 South Korea Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.3.7 ASEAN Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.3.8 India Based Company Sputtering Target for Semiconductor Revenue (2021-2032)
- 1.4 Market Drivers, Restraints and Trends
- 1.4.1 Sputtering Target for Semiconductor Market Drivers
- 1.4.2 Factors Affecting Demand
- 1.4.3 Major Market Trends
2 Demand Summary
- 2.1 World Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.2 World Sputtering Target for Semiconductor Consumption Value by Region
- 2.2.1 World Sputtering Target for Semiconductor Consumption Value by Region (2021-2026)
- 2.2.2 World Sputtering Target for Semiconductor Consumption Value Forecast by Region (2027-2032)
- 2.3 United States Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.4 China Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.5 Europe Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.6 Japan Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.7 South Korea Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.8 ASEAN Sputtering Target for Semiconductor Consumption Value (2021-2032)
- 2.9 India Sputtering Target for Semiconductor Consumption Value (2021-2032)
3 World Sputtering Target for Semiconductor Companies Competitive Analysis
- 3.1 World Sputtering Target for Semiconductor Revenue by Player (2021-2026)
- 3.2 Industry Rank and Concentration Rate (CR)
- 3.2.1 Global Sputtering Target for Semiconductor Industry Rank of Major Players
- 3.2.2 Global Concentration Ratios (CR4) for Sputtering Target for Semiconductor in 2025
- 3.2.3 Global Concentration Ratios (CR8) for Sputtering Target for Semiconductor in 2025
- 3.3 Sputtering Target for Semiconductor Company Evaluation Quadrant
- 3.4 Sputtering Target for Semiconductor Market: Overall Company Footprint Analysis
- 3.4.1 Sputtering Target for Semiconductor Market: Region Footprint
- 3.4.2 Sputtering Target for Semiconductor Market: Company Product Type Footprint
- 3.4.3 Sputtering Target for Semiconductor Market: Company Product Application Footprint
- 3.5 Competitive Environment
- 3.5.1 Historical Structure of the Industry
- 3.5.2 Barriers of Market Entry
- 3.5.3 Factors of Competition
- 3.6 Mergers & Acquisitions Activity
4 United States VS China VS Rest of World (by Headquarter Location)
- 4.1 United States VS China: Sputtering Target for Semiconductor Revenue Comparison (by Headquarter Location)
- 4.1.1 United States VS China: Sputtering Target for Semiconductor Revenue Comparison (2021 & 2025 & 2032) (by Headquarter Location)
- 4.1.2 United States VS China: Sputtering Target for Semiconductor Revenue Market Share Comparison (2021 & 2025 & 2032)
- 4.2 United States Based Companies VS China Based Companies: Sputtering Target for Semiconductor Consumption Value Comparison
- 4.2.1 United States VS China: Sputtering Target for Semiconductor Consumption Value Comparison (2021 & 2025 & 2032)
- 4.2.2 United States VS China: Sputtering Target for Semiconductor Consumption Value Market Share Comparison (2021 & 2025 & 2032)
- 4.3 United States Based Sputtering Target for Semiconductor Companies and Market Share, 2021-2026
- 4.3.1 United States Based Sputtering Target for Semiconductor Companies, Headquarters (States, Country)
- 4.3.2 United States Based Companies Sputtering Target for Semiconductor Revenue, (2021-2026)
- 4.4 China Based Companies Sputtering Target for Semiconductor Revenue and Market Share, 2021-2026
- 4.4.1 China Based Sputtering Target for Semiconductor Companies, Company Headquarters (Province, Country)
- 4.4.2 China Based Companies Sputtering Target for Semiconductor Revenue, (2021-2026)
- 4.5 Rest of World Based Sputtering Target for Semiconductor Companies and Market Share, 2021-2026
- 4.5.1 Rest of World Based Sputtering Target for Semiconductor Companies, Headquarters (Province, Country)
- 4.5.2 Rest of World Based Companies Sputtering Target for Semiconductor Revenue (2021-2026)
5 Market Analysis by Type
- 5.1 World Sputtering Target for Semiconductor Market Size Overview by Type: 2021 VS 2025 VS 2032
- 5.2 Segment Introduction by Type
- 5.2.1 Metal Sputtering Target Material
- 5.2.2 Alloy Sputtering Target Material
- 5.2.3 Non-metal Sputtering Target Material
- 5.3 Market Segment by Type
- 5.3.1 World Sputtering Target for Semiconductor Market Size by Type (2021-2026)
- 5.3.2 World Sputtering Target for Semiconductor Market Size by Type (2027-2032)
- 5.3.3 World Sputtering Target for Semiconductor Market Size Market Share by Type (2027-2032)
6 Market Analysis by Application
- 6.1 World Sputtering Target for Semiconductor Market Size Overview by Application: 2021 VS 2025 VS 2032
- 6.2 Segment Introduction by Application
- 6.2.1 Wafer Manufacturing
- 6.2.2 Wafer Assembly and Testing
- 6.3 Market Segment by Application
- 6.3.1 World Sputtering Target for Semiconductor Market Size by Application (2021-2026)
- 6.3.2 World Sputtering Target for Semiconductor Market Size by Application (2027-2032)
- 6.3.3 World Sputtering Target for Semiconductor Market Size Market Share by Application (2021-2032)
7 Company Profiles
- 7.1 JX Advanced Metals
- 7.1.1 JX Advanced Metals Details
- 7.1.2 JX Advanced Metals Major Business
- 7.1.3 JX Advanced Metals Sputtering Target for Semiconductor Product and Services
- 7.1.4 JX Advanced Metals Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.1.5 JX Advanced Metals Recent Developments/Updates
- 7.1.6 JX Advanced Metals Competitive Strengths & Weaknesses
- 7.2 Materion
- 7.2.1 Materion Details
- 7.2.2 Materion Major Business
- 7.2.3 Materion Sputtering Target for Semiconductor Product and Services
- 7.2.4 Materion Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.2.5 Materion Recent Developments/Updates
- 7.2.6 Materion Competitive Strengths & Weaknesses
- 7.3 Konfoong Materials International
- 7.3.1 Konfoong Materials International Details
- 7.3.2 Konfoong Materials International Major Business
- 7.3.3 Konfoong Materials International Sputtering Target for Semiconductor Product and Services
- 7.3.4 Konfoong Materials International Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.3.5 Konfoong Materials International Recent Developments/Updates
- 7.3.6 Konfoong Materials International Competitive Strengths & Weaknesses
- 7.4 Linde
- 7.4.1 Linde Details
- 7.4.2 Linde Major Business
- 7.4.3 Linde Sputtering Target for Semiconductor Product and Services
- 7.4.4 Linde Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.4.5 Linde Recent Developments/Updates
- 7.4.6 Linde Competitive Strengths & Weaknesses
- 7.5 Proterial
- 7.5.1 Proterial Details
- 7.5.2 Proterial Major Business
- 7.5.3 Proterial Sputtering Target for Semiconductor Product and Services
- 7.5.4 Proterial Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.5.5 Proterial Recent Developments/Updates
- 7.5.6 Proterial Competitive Strengths & Weaknesses
- 7.6 Plansee SE
- 7.6.1 Plansee SE Details
- 7.6.2 Plansee SE Major Business
- 7.6.3 Plansee SE Sputtering Target for Semiconductor Product and Services
- 7.6.4 Plansee SE Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.6.5 Plansee SE Recent Developments/Updates
- 7.6.6 Plansee SE Competitive Strengths & Weaknesses
- 7.7 TOSOH
- 7.7.1 TOSOH Details
- 7.7.2 TOSOH Major Business
- 7.7.3 TOSOH Sputtering Target for Semiconductor Product and Services
- 7.7.4 TOSOH Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.7.5 TOSOH Recent Developments/Updates
- 7.7.6 TOSOH Competitive Strengths & Weaknesses
- 7.8 Honeywell
- 7.8.1 Honeywell Details
- 7.8.2 Honeywell Major Business
- 7.8.3 Honeywell Sputtering Target for Semiconductor Product and Services
- 7.8.4 Honeywell Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.8.5 Honeywell Recent Developments/Updates
- 7.8.6 Honeywell Competitive Strengths & Weaknesses
- 7.9 Grinm Advanced Materials Co., Ltd.
- 7.9.1 Grinm Advanced Materials Co., Ltd. Details
- 7.9.2 Grinm Advanced Materials Co., Ltd. Major Business
- 7.9.3 Grinm Advanced Materials Co., Ltd. Sputtering Target for Semiconductor Product and Services
- 7.9.4 Grinm Advanced Materials Co., Ltd. Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.9.5 Grinm Advanced Materials Co., Ltd. Recent Developments/Updates
- 7.9.6 Grinm Advanced Materials Co., Ltd. Competitive Strengths & Weaknesses
- 7.10 ULVAC
- 7.10.1 ULVAC Details
- 7.10.2 ULVAC Major Business
- 7.10.3 ULVAC Sputtering Target for Semiconductor Product and Services
- 7.10.4 ULVAC Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.10.5 ULVAC Recent Developments/Updates
- 7.10.6 ULVAC Competitive Strengths & Weaknesses
- 7.11 TANAKA
- 7.11.1 TANAKA Details
- 7.11.2 TANAKA Major Business
- 7.11.3 TANAKA Sputtering Target for Semiconductor Product and Services
- 7.11.4 TANAKA Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.11.5 TANAKA Recent Developments/Updates
- 7.11.6 TANAKA Competitive Strengths & Weaknesses
- 7.12 Sumitomo Chemical
- 7.12.1 Sumitomo Chemical Details
- 7.12.2 Sumitomo Chemical Major Business
- 7.12.3 Sumitomo Chemical Sputtering Target for Semiconductor Product and Services
- 7.12.4 Sumitomo Chemical Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.12.5 Sumitomo Chemical Recent Developments/Updates
- 7.12.6 Sumitomo Chemical Competitive Strengths & Weaknesses
- 7.13 Luvata
- 7.13.1 Luvata Details
- 7.13.2 Luvata Major Business
- 7.13.3 Luvata Sputtering Target for Semiconductor Product and Services
- 7.13.4 Luvata Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.13.5 Luvata Recent Developments/Updates
- 7.13.6 Luvata Competitive Strengths & Weaknesses
- 7.14 Advantec
- 7.14.1 Advantec Details
- 7.14.2 Advantec Major Business
- 7.14.3 Advantec Sputtering Target for Semiconductor Product and Services
- 7.14.4 Advantec Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.14.5 Advantec Recent Developments/Updates
- 7.14.6 Advantec Competitive Strengths & Weaknesses
- 7.15 Longhua Technology Group (Luoyang)
- 7.15.1 Longhua Technology Group (Luoyang) Details
- 7.15.2 Longhua Technology Group (Luoyang) Major Business
- 7.15.3 Longhua Technology Group (Luoyang) Sputtering Target for Semiconductor Product and Services
- 7.15.4 Longhua Technology Group (Luoyang) Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.15.5 Longhua Technology Group (Luoyang) Recent Developments/Updates
- 7.15.6 Longhua Technology Group (Luoyang) Competitive Strengths & Weaknesses
- 7.16 Furuya Metal
- 7.16.1 Furuya Metal Details
- 7.16.2 Furuya Metal Major Business
- 7.16.3 Furuya Metal Sputtering Target for Semiconductor Product and Services
- 7.16.4 Furuya Metal Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.16.5 Furuya Metal Recent Developments/Updates
- 7.16.6 Furuya Metal Competitive Strengths & Weaknesses
- 7.17 Umicore Thin Film Products
- 7.17.1 Umicore Thin Film Products Details
- 7.17.2 Umicore Thin Film Products Major Business
- 7.17.3 Umicore Thin Film Products Sputtering Target for Semiconductor Product and Services
- 7.17.4 Umicore Thin Film Products Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.17.5 Umicore Thin Film Products Recent Developments/Updates
- 7.17.6 Umicore Thin Film Products Competitive Strengths & Weaknesses
- 7.18 Angstrom Sciences
- 7.18.1 Angstrom Sciences Details
- 7.18.2 Angstrom Sciences Major Business
- 7.18.3 Angstrom Sciences Sputtering Target for Semiconductor Product and Services
- 7.18.4 Angstrom Sciences Sputtering Target for Semiconductor Revenue, Gross Margin and Market Share (2021-2026)
- 7.18.5 Angstrom Sciences Recent Developments/Updates
- 7.18.6 Angstrom Sciences Competitive Strengths & Weaknesses
8 Industry Chain Analysis
- 8.1 Sputtering Target for Semiconductor Industry Chain
- 8.2 Sputtering Target for Semiconductor Upstream Analysis
- 8.3 Sputtering Target for Semiconductor Midstream Analysis
- 8.4 Sputtering Target for Semiconductor Downstream Analysis
9 Research Findings and Conclusion
10 Appendix
- 10.1 Methodology
- 10.2 Research Process and Data Source
The global Sputtering Target for Semiconductor market size is expected to reach $ 3743 million by 2032, rising at a market growth of 6.7% CAGR during the forecast period (2026-2032).
A sputtering target for semiconductors is a high-purity material used in the sputtering process, a form of physical vapor deposition (PVD), to create thin films on semiconductor wafers. These thin films are essential in the manufacturing of integrated circuits (ICs) and other semiconductor devices. During the sputtering process, high-energy particles (typically ions) bombard the target material, causing its atoms or molecules to be ejected and deposited onto the wafer. This method provides precise and uniform thin films, forming the various functional layers required in semiconductor devices.
In wafer assembly and testing, sputtering targets are crucial for depositing essential thin films in the final stages of semiconductor production. Wafer assembly involves bonding and packaging the ICs, while testing ensures their performance and reliability. The sputtering process is used to apply layers that enhance the connectivity, protection, and functionality of ICs during the packaging and testing phases, contributing to the overall quality and durability of semiconductor products.
The sputtering target market for semiconductors is a key component of the global electronics supply chain, driven by rapid advancements in semiconductor technology. Sputtering targets are essential for depositing thin films on semiconductor wafers, used in integrated circuits and memory chips. As semiconductor manufacturing evolves, particularly with the push toward smaller nodes like 3nm, demand for high-performance materials is growing, especially in sectors like consumer electronics, automotive electronics, and emerging technologies such as 5G and artificial intelligence (AI).
One significant driver is the need for more efficient chips, particularly in consumer electronics like smartphones, wearables, and tablets. These devices require high-purity metals, alloys, and non-metals to ensure that thin films meet the necessary electrical and thermal properties. The automotive industry also fuels growth, with electric vehicles (EVs), autonomous driving, and advanced driver-assistance systems (ADAS) demanding semiconductors for power electronics and sensors. Additionally, the expansion of 5G and AI infrastructures requires advanced semiconductors, further driving the need for specialized sputtering targets.
Challenges in the market primarily relate to the supply of raw materials, such as tungsten, molybdenum, and copper. These materials can be affected by supply chain disruptions and geopolitical issues, leading to cost increases and production delays. Moreover, as semiconductor technology advances, sputtering targets must meet increasingly stringent purity and precision standards, driving the need for continuous innovation.
Despite these challenges, the market is expected to grow steadily, with Asia-Pacific leading in demand due to its semiconductor manufacturing dominance, particularly in China, Taiwan, South Korea, and Japan. North America and Europe are also poised for growth, supported by government initiatives aimed at boosting domestic semiconductor production. While raw material constraints and technological complexity remain challenges, the market holds significant potential for future expansion and innovation.
This report studies the global Sputtering Target for Semiconductor demand, key companies, and key regions.
This report is a detailed and comprehensive analysis of the world market for Sputtering Target for Semiconductor, and provides market size (US$ million) and Year-over-Year (YoY) growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Sputtering Target for Semiconductor that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Sputtering Target for Semiconductor total market, 2021-2032, (USD Million)
Global Sputtering Target for Semiconductor total market by region & country, CAGR, 2021-2032, (USD Million)
U.S. VS China: Sputtering Target for Semiconductor total market, key domestic companies, and share, (USD Million)
Global Sputtering Target for Semiconductor revenue by player, revenue and market share 2021-2026, (USD Million)
Global Sputtering Target for Semiconductor total market by Type, CAGR, 2021-2032, (USD Million)
Global Sputtering Target for Semiconductor total market by Application, CAGR, 2021-2032, (USD Million)
This report profiles major players in the global Sputtering Target for Semiconductor market based on the following parameters - company overview, revenue, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include JX Advanced Metals, Materion, Konfoong Materials International, Linde, Proterial, Plansee SE, TOSOH, Honeywell, Grinm Advanced Materials Co., Ltd., ULVAC, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the world Sputtering Target for Semiconductor market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), by player, by regions, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Sputtering Target for Semiconductor Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Sputtering Target for Semiconductor Market, Segmentation by Type:
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material
Global Sputtering Target for Semiconductor Market, Segmentation by Application:
Wafer Manufacturing
Wafer Assembly and Testing
Companies Profiled:
JX Advanced Metals
Materion
Konfoong Materials International
Linde
Proterial
Plansee SE
TOSOH
Honeywell
Grinm Advanced Materials Co., Ltd.
ULVAC
TANAKA
Sumitomo Chemical
Luvata
Advantec
Longhua Technology Group (Luoyang)
Furuya Metal
Umicore Thin Film Products
Angstrom Sciences
Key Questions Answered
1. How big is the global Sputtering Target for Semiconductor market?
2. What is the demand of the global Sputtering Target for Semiconductor market?
3. What is the year over year growth of the global Sputtering Target for Semiconductor market?
4. What is the total value of the global Sputtering Target for Semiconductor market?
5. Who are the Major Players in the global Sputtering Target for Semiconductor market?
6. What are the growth factors driving the market demand?